D. Jonker (UT), Z. Jafari, J. P. Winczewski, C. Eyovge, J. W. Berenschot,
N. R. Tas, J. G. E. Gardeniers, I. De Leon and A. Susarrey-Arce
MCEC PhD Dirk Jonker‘ (UT) publication reports on the fabrication and modification of a top-down nanofabrication platform for enormous parallel silicon nanowire-based devices. In they paper the authors explain the nanowire formation in detail, using an additive hybrid lithography step, optimising a reactive ion etching recipe for obtaining smooth and vertical nanowires under a hybrid mask, and embedding the nanowire in a dielectric membrane.